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Analysis and Characterization of Circuits for Leakage Power Reduction at Sub-50 nm in CMOS Circuits
Abstract: This paper analyzes various techniques to decrease leakage power in complementary metal oxide semiconductor (CMOS) very large scale integration (VLSI) circuits, because due to continuous scaling of CMOS technology there is improvement in speed of semiconductor devices and the side effect of this scaling is leakage power. With the development of technology in CMOS VLSI Circuit, length of transistors has been reduced and speed of operation is increasing simultaneously. As …
Published in Journal of Electronic Design Technology · Vol. 13, Issue 2, 2022 · pp. 11–22 Read article