Journal of Nanoscience, NanoEngineering & Applications

Laser Induced Damage Threshold of Pure and Doped TiO2 Thin Films

  1. Kirti Kapoor
  2. Devendra Mohan
  3. Ravish Garg
  4. Atul Kumar

Abstract

In the present study, TiO2 and Ag-doped TiO2 thin films have been synthesized by sol-gel dip coating technique at a constant rate of 40 cm/s and annealed at a temperature of 400o c to obtain uniform film with good adhesion onto the substrate. Films have been characterized by XRD and UV-Vis spectroscopy that shows the structure of TiO2 films and decrease in band gap with doping of silver in TiO2. Pulse laser damage threshold (PLDT) studies of these films have been carried out using ND-YAG laser at ̴ 532 nm and 5ns pulse width. Damage threshold of silver doped TiO2 and un-doped TiO2 films are found 14.15uJ/cm2 and 13.26 uJ/cm2respectively and these results shows that Doping of silver particles in TiO2 enhances the stability of the films.Keywords: Dip-coating, XRD, UV-Vis, Damage threshold
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