1 publication

• Published Subscription 25 Apr 2018

  Study of Scaling of MOSFET on Various Electrical Characteristics using Silvaco TCAD Tool

  By Prashant Kumar, Munish Vashistath, P.K. Bansal

  Abstract: MOSFETs are the driving work horse of semiconductor industry. Over the years, the MOSFET device density has been continuously increasing owing to the reduction in channel length of MOSFET device. This article discusses the effect of scaling i.e. channel length and gate oxide thickness on various parameters like threshold voltage, transconductance, maximum drain current and subthreshold slope. It is important to consider that with scaling of the channel length; the …

  Published in Journal of Semiconductor Devices and Circuits · Vol. 5, Issue 1, 2018 · pp. 11–19 Read article →