Physical vapour deposition; thin films; magnetron sputtering; cathodic arc deposition; electron-beam evaporation; plasma-assisted deposition; surface engineering; nanostructured coatings; protective c

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• Published Ahead of print Subscription Review Article

  Advances in Physical Vapour Deposition (PVD): Principles, Processes, Challenges, and Industrial Applications

  By Yahaya Kudush Kawa

  Abstract: Physical Vapour Deposition (PVD) is widely used to produce thin films and protective coatings for applications where the surface properties of a material are as important as its bulk properties. The process involves converting a solid source material into vapour or energetic particles, transporting these species through a controlled environment, and depositing them onto a substrate to form a thin film. Over the years, improvements in PVD equipment and deposition …

  Published in Journal of Thin Films, Coating Science Technology & Application Read article →