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Effect of Hafnium on Nickel-Titanium based Thin Film Coating by DC/RF Magnetron Sputtering TechniqueBy Dibyendu Roy, Shampa Aich
Abstract: Ni-Ti-Hf films as shape memory alloys were successfully prepared by magnetron sputtering technique using individual Ti, Ni and Hf targets. The hafnium content was varied from 6% to 30% and the required film composition was achieved by adjusting the power ratio to the targets. The as-deposited films were amorphous; a post deposition annealing was performed at 700 °C to crystallize the Ni-Ti-Hf films. Structural, compositional and phase-transformation studies were carried …
Published in Journal of Nanoscience, NanoEngineering & Applications · Vol. 2, Issue 3, 2012 Read article →